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Polyera Co-Founder Wins 2009 Von Hippel Award

1 October 2009 — Polyera Co-founder and Scientific Advisor Tobin J. Marks will be presented with the 2009 Von Hippel Award, the highest honor given by the Material Research Society.

The stated purpose of the award is to recognize “those qualities most prized by materials scientists and engineers--brilliance and originality of intellect, combined with vision that transcends the boundaries of conventional scientific disciplines.”

Dr. Marks is being recognized for advancing “materials science across a spectrum from self assembly to crystal growth, encompassing organic electronic, photonic, and photovoltaic materials, andoxide dielectrics, conductors, and superconductors.”

Dr. Marks will accept the honor during the awards ceremony at the 2009 MRS Fall Meeting in Boston. Although being awarded the honor for his work across many different areas of materials science, in the area of printed electronics, Dr. Marks was cited for both his rational design of tunable, environmentally-stable n-type organic semiconductor classes that form the basis of substantial parts of Polyera's IP portfolio, as well as the development of high-k dielectrics from self-assembled nanodielectrics, enabling sub-1V organic transistor operation.

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Brendan Florez
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